| 摘要 |
PURPOSE:To equalize the pressure in a chamber wherein a frame with a pellicle and a substrate are mounted to specific pressure of an exposing device which uses a substrate with a pellicle by providing a pressure control means which controls the pressure in the chamber to the specific pressure. CONSTITUTION:A pressure sensor 1f is installed in a chamber room 1e wherein a mounting mechanism 1a mounted with the frame with the pellicle and the substrate is arranged, and the pressure information of the pressure sensor 1f is outputted to a pressure controller 1g provided outside the chamber 1b. Standard pressure of the exposing device is set in the pressure controller 1g from an external input device and the pressure controller 1g puts an air blower 1c in operation so that the pressure in the chamber room 1e reaches the set pressure; and then the capacity of air flowing in the chamber room 1e is increased or decreased to control the pressure in the chamber room 1e. Consequently, a different in pressure when the substrate with the pellicle can be eliminated and the deformation of the pellicle due to a difference in pressure is eliminated. |
