| 摘要 |
<p>PURPOSE:To obtain the manufacturing method for a high resistance film having the specific resistance value several times higher than that of the conventional Ni-Cr alloy film and also having a practical resistance temperature coefficient. CONSTITUTION:This is the method in which a high resistance film, containing boron of 20 to 80wt.% in transition metal which is at least a kind selected from Cr, Mo, Nb, Ta, Ti, W and Zr, is formed on a substrate by evaporating the transition metal and boron simultaneously from the independent sources of evaporation respectively by changing the amount of evaporation.</p> |
