| 摘要 |
PURPOSE:To attain manufacture of a track of a miniature size by using an X- ray beam for the reaction of photosensitivity of a resist on a master disc. CONSTITUTION:A glass plate 1 is used as the optical disc forming master disc 1 and a PMMA (polymethylmethacrylate) resist 2 is formed on it by rotary coating. Then an X-ray beam 5 is irradiated on the resist 2 and the said X-ray beam is obtained in the following. An electron ray 3 is allowed to collide with a target 4 to generate the X-ray. The power of the electron ray is 20kW, the target is Mo and the target is cooled by flowing water while being turned. The major component of the X-ray 5' generated in this case is MoLalpha and its wavelength is 0.54nm. After the X-ray generated by the target passes through a window made of Be, the result is extracted in air. Then the X-ray beam 5 with minute diameter is obtained by passing the X-ray through slits 7, 7' where fine holes are opened. |
