发明名称 PHOTOSENSITIVE COMPOSITION
摘要 PURPOSE:To provide a photosensitive composition highly soluble even in an organic solvent-free photographic developer, causing no insoluble deposition, comprising a photocrosslinkable polymer having photodimerizable unsaturated bond and a specific photosensitizer. CONSTITUTION:The objective composition comprising (A) 10-99 (pref. 50-99)wt.% of a photocrosslinkable polymer having photodimerizable unsaturated bond (pref. having in the side chain at least two malemidie groups on average per molecule and >=1000 in average molecular weight) and (B) 1-30 (pref. 2-20)wt.% of a photosensitizer of formula II [Z is nonmetallic atom group necessary for forming a nitrogen-contg. heterocyclic nucleus; Y is nonmetallic atom group necessary for forming a ring; R1 is (substituted) alkyl; R2 and Rd3 are each H, (substituted) alkyl, (substituted) aryl or halogen; at least one of Z, Y and R1 contains at least one COOH, NHSO2R4 R4 is alkyl, aromatic group, etc), etc.; n is an integer of 0-4] E e.g. of formula II (R'' is CH2COOH, etc.,)].
申请公布号 JPH06107718(A) 申请公布日期 1994.04.19
申请号 JP19920259915 申请日期 1992.09.29
申请人 FUJI PHOTO FILM CO LTD 发明人 MIYAKE HIDEO;KURITA HIROMICHI;SHIRAISHI YUICHI;KAWAMURA KOICHI
分类号 C08F2/50;G03F7/004;G03F7/027;G03F7/031;G03F7/038;H01L21/027;H01L21/30;(IPC1-7):C08F2/50 主分类号 C08F2/50
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