发明名称 |
Imaging method for manufacture of microdevices |
摘要 |
An imaging method for imaging a fine pattern having linear features extending along orthogonal first and second directions is disclosed, which method is characterized by: providing a light source having decreased intensity portions at a center thereof and on first and second axes defined to intersect with each other at the center and defined along the first and second directions, respectively; and illuminating the pattern with light from the light source.
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申请公布号 |
US5305054(A) |
申请公布日期 |
1994.04.19 |
申请号 |
US19920836509 |
申请日期 |
1992.02.18 |
申请人 |
CANON KABUSHIKI KAISHA |
发明人 |
SUZUKI, AKIYOSHI;NOGUCHI, MIYOKO |
分类号 |
G03F7/20;(IPC1-7):G03B27/42 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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