发明名称 TOP RING VACUUM SUCTION DEVICE FOR POLISHING DEVICE
摘要 PURPOSE:To prevent a vacuum line from being clogged by polishing grinding liquid or cleaning water and the like, or prevent a vacuum discharge part from being flooded with water. CONSTITUTION:Turntables to rotate in the respective independent number of revolutions and a top ring body 3 are provided, and a means is provided to apply constant pressure to the turntables while the top ring body 3 is sliding. In a polishing device to polish and transform the surface of a polishing object 6 into a flat mirror surface while interposing the polishing object 6 between the turntables and the top ring body 3, a large number of small holes whose tips are opened on the under surface of the top ring body 3 and which are communicated to a vacuum source, are provided in the top ring body 3, and a drain pot 12 is provided in in a vacuum pipe communicated with the vacuum source of a vacuum suction mechanism to attract the polishing object 6 to the under surface of the top ring body 3 under vacuum.
申请公布号 JPH06106474(A) 申请公布日期 1994.04.19
申请号 JP19920280492 申请日期 1992.09.25
申请人 EBARA CORP 发明人 KIMURA NORIO;KAWASHIMA KIYOTAKA
分类号 B23Q3/08;B24B37/04;B24B37/30;H01L21/304 主分类号 B23Q3/08
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