| 摘要 |
PURPOSE:To form a mask layout capable of compacting a large-scale integrated circuit and capable of suppressing the loss of a chip area by using an ordinary design assist. CONSTITUTION:The graphic data showing the mask layout 11 of an integrated circuit are firstly divided along plural longitudinal lines 13 into plural fragments 11x to 11x+3, the fragments are compacted, all the compacted fragments 11x to 11x+3 are divided into plural fragments 11y to 11y+3 along plural lateral lines 14, the fragments are compacted, and the compacted fragments 11 to 11y+3 are connected. Accordingly, since the fragments are compacted one by one, there is no upper processing limit, and a large-scale mask layout is formed with the existing design assist. |
