发明名称 Arrangement for metal concentration stabilisation in copper@ plating cylinders - by use of an auxiliary anode in addition to main copper@ anode
摘要 In the plating of low pressure cylinder or rotary, bodies with Cu, an insoluble anode (3) of e.g. platinised expanded metal, dimensioned according to cylinder size, is positioned between the cathodic cylinder (1) and the anode (6), supplied by an auxiliary circuit (4). Metal ion discharge takes place at the cylinder by electrolysis with the Cu chips in the anode basket and directly from the electrolyte soln. by interpolation of the auxiliary anode. ADVANTAGE - Stabilises metal concn. in the acid Cu electrolyte. Furthermore, metal ion discharge from the copper sulphate solution into the electrolytic bath is activated.
申请公布号 DE4235227(A1) 申请公布日期 1994.04.14
申请号 DE19924235227 申请日期 1992.10.13
申请人 GALVANOTECHNIK JUERGEN ROSSMANN GMBH, 63477 MAINTAL, DE 发明人 ROSSMANN, JUERGEN, 6457 MAINTAL, DE
分类号 C25D3/38;C25D5/00;C25D21/14;(IPC1-7):C25D21/14;C25D7/00;B41N1/00 主分类号 C25D3/38
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