发明名称 METHOD AND APPARATUS FOR SURFACE ANALYSIS
摘要 <p>A method and an apparatus for surface analysis suitable for qualitative and quantitative analyses of residue on the surface of a specimen by irradiating the surface of the specimen with a sharply focused electron beam and detecting fluorescent X-rays radiated from the surface of the specimen. The electron beam (1) is projected into a fine hole (h) in the surface of the specimen (2) through an aperture (9) which is provided at the center of an X-ray detector (8). Fluorescent X-rays (5) which are radiated from the fine hole (h) due to the irradiation with the electron beam (1) are detected in the paraxial direction of the electron beam (1) (desirably, within 20 degrees to the axis of the electron beam) by the annular X-ray detector (8) having an energy analysis function. With the adoption of such a structure, fluorescent X-rays (5) from the fine hole (h) are able to reach the X-ray detector (8) without being absorbed by the substance of the specimen. Therefore, it is possible to analyze the residue in the fine hole both qualitatively and quantitatively with a high precision even when its aspect ratio is high. Since this method is non-destructive, it is possible to return the specimen to the process of the manufacture after the analysis.</p>
申请公布号 WO1994008232(P1) 申请公布日期 1994.04.14
申请号 JP1993001373 申请日期 1993.09.27
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