STOCKING METHOD OF SILICON WAFER

摘要

PURPOSE:To increase degree of freedom in device process while retarding growth of spontaneous oxide by stocking a cleaned silicon wafer in an enclosed container. CONSTITUTION:A cleaned silicon wafer is stocked in an enclosed. container. For example, a mirror polished silicon wafer is cleaned with HF cleaning liquid and then stocked in an enclosed container. HF cleaning is performed such that the silicon wafer is immersed in aqueous solution of 1% hydrofluoric acid for several tens seconds under room temperature. The silicon wafer is stocked in a plastic enclosed container of 5l volume in a clean room (atmosphere) with the inner temperature and humidity of the enclosed container being set, respectively, at 25 deg.C and 50%. When the silicon wafer is stocked in an enclosed case spotaneous oxide grows by 1Angstrom upon elapse of 24 hours, whereas when the silicon wafer is cleaned under same conditions and stocked in an open clean room spontaneous oxide grows by 6Angstrom upon elapse of 24 hours.