首页
产品
黄页
商标
征信
会员服务
注册
登录
全部
|
企业名
|
法人/股东/高管
|
品牌/产品
|
地址
|
经营范围
发明名称
DRY ETCHING METHOD
摘要
申请公布号
JPH0697123(A)
申请公布日期
1994.04.08
申请号
JP19920245097
申请日期
1992.09.14
申请人
SONY CORP
发明人
KADOMURA SHINGO
分类号
H01L21/28;H01L21/302;H01L21/3065;(IPC1-7):H01L21/302
主分类号
H01L21/28
代理机构
代理人
主权项
地址
您可能感兴趣的专利
POWER CONTROL METHOD AND OPERATING DEVICE FOR INVERTER
GAS ENGINE-DRIVEN SPACE COOLER/HEATER
IMMUNOACTIVATING AGENT AND PRODUCTION THEREOF
PREPARATION OF 3-PHENOXYBENZYL ALCOHOL
OXIDE METAL FILM RESISTOR CONSTITUTED OF THREE LAYERS
VOLTAGE-DEPENDENT NONLINEAR RESISTOR
CURRENT DETECTOR
DUCT LINE WATER STOP STRUCTURE AND FORMATION THEREOF
ELECTRIC-SUPPLY EQUIPMENT
BIOLOGICAL PURIFYING METHOD OF SEWAGE AND ITS APPARATUS
METHOD FOR CONTROLLING WATER QUALITY IN ACTIVATED SLUDGE PROCESS
EXTRA-HIGH-PRESSURE WATER JET WATER BOTTOM EXCAVATOR
OVERHEAD CAMSHAFT TYPE INTERNAL COMBUSTION ENGINE
SAFETY BINDING FOR SKI
IMAGE FORMING DEVICE
SEMICONDUCTOR DEVICE AND LEAD FRAME
THERMOPLASTIC RESIN COMPOSITION
SELENIUM AZOLYL DERIVATIVE
(A) ;AMINO ACID DERIVATIVE
AUTOFOCUS MECHANISM
