发明名称 SURFACE WORKING DEVICE AND RECORDING DEVICE
摘要 PURPOSE:To accomplish very speedy an stable surface working on the order of nm or to the level of an atom at the room temperature in the atmosphere by performing surface working with a scanning probe microscope(SPM) capable of measuring a conductor to an insulator. CONSTITUTION:The probe refers to a probe 1 provided in the tip of a cantilever 2, and force acting between an atom at the tip and an atom in the surface of a sample 4 is detected by sensing with a position sensor 7 the displacement of laser light reflected by the rear surface of the lever 2 to control a sample mounting base so that the warp of the lever 2 is kept constant to obtain a surface image from the movement of the sample 4. In order to add the surface working function, an insulating surface of a probe is coated with Au, Ga and the like to provide a conductive layer 3, and then a voltage is applied with a working voltage applying device 12 between the probe 1 made conductive and the sample 4. A pit or a mound can be formed on the surface of a sample with a voltage in the form of a pulse is applied thereto.
申请公布号 JPH0696714(A) 申请公布日期 1994.04.08
申请号 JP19920244508 申请日期 1992.09.14
申请人 HITACHI LTD 发明人 KOYANAGI HAJIME;HOSAKA SUMIO;IMURA AKIRA
分类号 B82B3/00;G01Q30/02;G01Q60/00;G01Q60/10;G01Q60/12;G01Q60/18;G01Q60/24;G01Q60/40;G01Q60/56;G01Q60/58;G01Q70/14;G01Q80/00;G11B9/00;G11B9/14;G11B11/00;G11B11/03;H01J37/28;H01J37/30;(IPC1-7):H01J37/30 主分类号 B82B3/00
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