发明名称 FORMATION HETERO-INTERFACE
摘要 PURPOSE:To improve quality at a hetero interface, by inserting a group III atom layer into the hetero interface, in which compositional change is necessary for a group V element in a III-V compound semiconductor. CONSTITUTION:A hetero-interface is formed between layers 11 and 13 made of III-V compound, each containing group III element 3A or 3B together with a different group V element 5A or 5B. Then, a metal layer 12 made of atoms 3C is inserted in the hetero-interface. In this case, chemical bonding force between two elements 3C-5A is almost equal to that to two elements 3C-5B or an expression of inequality 3C-5A>3C-5B is satisfied. In the III-V compound layer 11, atomic substitution of the atoms 5B for the atoms 5A can be reduced, and thereby a hetero-interface of high quality can be obtained.
申请公布号 JPH0697097(A) 申请公布日期 1994.04.08
申请号 JP19930187848 申请日期 1993.07.29
申请人 NEC CORP 发明人 ANAMI TAKAYOSHI;NANBAE KOICHI
分类号 C30B23/08;C30B25/02;C30B29/40;H01L21/203;H01L21/205;H01L33/06;H01L33/30 主分类号 C30B23/08
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