| 摘要 |
PURPOSE: To obtain a metal oxide layer through a small amount of free metal particles in a metal particle source by a method wherein the upper limit of kinetic energy of free metal particles is set, and the volume ratio of introduced oxygen to free metal is selected. CONSTITUTION: A vacuum exhaust vessel 1 is exhausted by a vacuum pump 17 to a starting pressure of 10<-6> mbar or below, preferably 10<-9> mbar or below. Metal is set so free as to make the maximum kinetic energy of metal particles as high as 10 eV and evaporated through an electron beam evaporation unit 13. Then, oxygen is introduced into the vacuum exhaust vessel 1 through the intermediary of a gas introduction device 7 or 7a. In this case, the volume of oxygen introduced into the vacuum exhaust vessel 1 per hour is so selected as to be uniformly distributed onto a surface to coat and to oxidize the surfaces of the metal particles at a prescribed oxidation rate. In this case, a substrate temperatureθis set lowest, preferably at 90 deg.C or below, and preferably, oxygen is kept at a temperature of 600 deg.C or below.
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