PHOTOMASK BLANK, ITS PRODUCTION AND PHOTOMASK

摘要

PURPOSE:To produce a photomask blank usable for a stepper using light of short wavelength such as KrF excimer laser light as a light source and to provide a photomask. CONSTITUTION:A light shielding thin film 2 having a compsn. contg. silicon and oxygen in (1:0)-(1:1.5) ratio of Si:O is formed on a transparent substrate 1 by sputtering and an antireflection film 3 of silicon nitride or silicon carbide is formed on the light shielding thin film 2 by sputtering to produce the objective photomask blank. The objective photomask is formed by pattering the photomask blank.