RESIST PATTERN FORMING METHOD

摘要

PURPOSE:To form a negative resist pattern free of residue at an unexposed part. CONSTITUTION:When at least an acid generating agent and a crosslinking agent are added to phenolic resin to obtain a resist, the phenolic resin is prepd. by removing a low mol.wt. component with a good solvent and a poor solvent. A substrate to be treated is coated with the resulting resist, this resist is selectively exposed with ionized radiation and the unexposed part is dissolved by development to form the objective resist pattern.