Epitaxiales Substrat für hochintensive LEDS und Herstellungsverfahren.,申请号DE1989611322T-传众专利搜索

首页产品黄页商标征信

会员服务注册登录

法人/股东/高管

发明名称	Epitaxiales Substrat für hochintensive LEDS und Herstellungsverfahren.
摘要
申请公布号	DE68911322(T2)	申请公布日期	1994.04.07
申请号	DE1989611322T	申请日期	1989.01.23
申请人	MITSUBISHI KASEI POLYTEC CO., TOKIO/TOKYO, JP;MITSUBISHI KASEI CORP., TOKIO/TOKYO, JP	发明人	NOGUCHI, MASAHIRO MITSUBISHI MONSANTO CHEMICAL CO., USHIKU-SHI IBARAKI 300-12, JP;GOTOH, HIDEKI C/O MITSUBISHI MONSANTO CHEMICAL CO., USHIKU-SHI IBARAKI 300-12, JP;SHIMOYAMA, KENJI C/O MITSUBISHI MONSANTO CHEM.CO., USHIKU-SHI IBARAKI 300-12, JP
分类号	H01L21/208;H01L21/20;H01L33/16;H01L33/30;(IPC1-7):H01L33/00	主分类号	H01L21/208
代理机构		代理人
主权项
地址

您可能感兴趣的专利

Use of sphingomyelinase to increase the levels of skin and mucosal ceramides, and dermatological and cosmetic compositions suitable for topical application containing same

Self-assembled lipid bilayer materials

Roofing component adhering assembly and method

Exercising apparatus

Revolvable plug and socket

Paintball harness

Ultra-flat box for insert

Pedestal computer docking station

Multilayer, biaxially oriented polyester film, process for its production and its use

Cosmetic and dermatological preparations comprising increased electrolyte concentrations

Method and apparatus for determining the length of single-walled carbon nanotubes

Fused off-axis object illumination direct-to-digital holography with a plurality of illumination sources

Activated alumina formed body and method for producing the same

Video frame synthesis

Method for estimating the motion between two digital images with management of mesh overturning and corresponding coding method

Delta-sigma digital-to-analog converter assembly

Composite polymer dielectric film

Pentafluorobenzenesulfonamides and analogs

Sludge inerting method