发明名称 MANUFACTURE OF BASE FOR RECORDING HEAD AND CORRECTING METHOD OF FILM THICKNESS OF POSITIVE TYPE PHOTOSENSITIVE RESIST
摘要 PURPOSE:To contrive improvements in adhesion and reliability between a protective film and a substrate of a base and securing of mass-production without being influenced by a delicate factor in a film making condition and a delicate change in a process before film making, by a method wherein a specific quantity of light of ultraviolet rays is applied beforehand to the tops of an electric converter body, an electrode and the subtrate of the base prior to formation of the protective film. CONSTITUTION:A quantity of light of ultraviolet rays is made into 6000mJ/cm<2> (in the surface of a base) or lower which is made preferably into 300-6000mJ/cm<2> and applied to the surface of a substrate of a base 111 where an electric thermal converter body 120 and a pair of electrodes are formed. A low tension mercury-vapor lamp is used for irradiation of the ultraviolet rays and a lamp made of syntehtic quartz is preferable among the other lamps. Then a purification degree of the surface of the base by irradiation of ultraviolet rays is decided by luminous intensity of the ultraviolet rays and a time, that is the quantity of light of the ultraviolet rays. Therefore, a matter other than the quantity of light of the ultraviolet rays is not provided especially. Damage of the electric thermal converter body 120 can be prevented by making the quantity of light of the ultraviolet rays into 6000mJ/cm<2> or lower and deterioration of durability is prevented.
申请公布号 JPH0691884(A) 申请公布日期 1994.04.05
申请号 JP19920242245 申请日期 1992.09.10
申请人 CANON INC 发明人 YOKOTA MASAMI;MURAKAMI KEIICHI
分类号 B41J2/16;G03F7/38;(IPC1-7):B41J2/16 主分类号 B41J2/16
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