发明名称 |
Molybdenum enhanced low-temperature deposition of crystalline silicon nitride |
摘要 |
A process for chemical vapor deposition of crystalline silicon nitride which comprises the steps of: introducing a mixture of a silicon source, a molybdenum source, a nitrogen source, and a hydrogen source into a vessel containing a suitable substrate; and thermally decomposing the mixture to deposit onto the substrate a coating comprising crystalline silicon nitride containing a dispersion of molybdenum silicide.
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申请公布号 |
US5300322(A) |
申请公布日期 |
1994.04.05 |
申请号 |
US19920849542 |
申请日期 |
1992.03.10 |
申请人 |
MARTIN MARIETTA ENERGY SYSTEMS, INC. |
发明人 |
LOWDEN, RICHARD A. |
分类号 |
C23C16/30;C23C16/34;(IPC1-7):C23C16/34;C23C16/42 |
主分类号 |
C23C16/30 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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