| 摘要 |
PURPOSE:To provide a cyclic carbonic acid ester compound useful as a dissolution inhibiting agent to give a positive photoresist composition having various excellent properties such as resolution, profile and sensitivity. CONSTITUTION:The compound of formula I [R1 to R9 are H, halogen, (substituted) alkyl or alkenyl, t-butoxycarbonyloxy or acetyl provided that at least one of R1 to R4 is t-butoxycarbonyloxy and at least one of R5 to R9 is t-butoxycarbonyloxy]. The compound can be produced by reacting a compound of formula II [Z1 to Z9 are H, halogen, (substituted) alkyl or alkenyl, OH or acetyl provided that at least one of Z1 to Z4 and at least one of Z5 to Z9 are OH] with di-t-butyl dicarbonate in the presence of a basic catalyst. A positive-type chemical amplification photoresist composition is prepared by compounding the compound with an alkali-soluble resin (e.g. polyvinylphenol) and an acid generator (e.g. sulfonic acid ester of an N-hydroxyimide compound). |
