| 摘要 |
PURPOSE:To provide a composition containing a compound having a substituent decomposable by acid, a compound generating acid by light irradiation and an amine compound containing silicon, exhibiting high resolution without forming eaves on the surface and useful for LSI, etc. CONSTITUTION:The composition contains, as essential components, (A) a compound having a substituent decomposable by an acid, e.g. a polymer of formula I (R<1> is univalent organic group; (m) is >=0; (n) is positive integer), (B) preferably 0.5-20wt.% (based on the total solid component of the composition) of a compound generating acid by light-irradiation, e.g. an onium salt and (C) (preferably 10-100mol% based on the molar concentration of the component B) of an Si- containing amine compound of formula II (R<2> and R<3> are bivalent organic group; R<4> to R<7> are univalent organic group; L is positive integer), e.g. 1,3-bis(4- aminobutyl)tetramethyldisiloxane. |
