| 摘要 |
A projection exposure apparatus is provided with a light source generating pulsed light, a rotary deflecting prism for deviating the light beam from the light source, fly's eye lenses for forming surface light sources in succession by thus deviated light beam, and a condenser lens for condensing the light from the fly's eye lens for illuminating the reticle. The pulsed light from the light source is alternately introduced into the fly's eye lenses by every pulse or by every plural number of pulses.
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