发明名称 |
Optical technique for rapid inspection of via underetch and contamination |
摘要 |
Sensitivity and resolution of an automated inspection system are improved and data processing loads for defect detection are reduced, increasing inspection speed, by fully illuminating an area corresponding to a nominal feature shape formed on a surface. Scanning of the illuminated area thus provides resolution of defects far smaller than the area of the illuminated spot. A preferred application of this automated inspection system is for the high speed screening of lamina or substrates having a pattern of through-holes formed therein, particularly for the formation of via connections therein. Screening for insufficient clear area of through-holes is done simply by applying a threshold to the output representing the amount of illumination transmitted and preferably reflected through the through-hole.
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申请公布号 |
US5301012(A) |
申请公布日期 |
1994.04.05 |
申请号 |
US19920968733 |
申请日期 |
1992.10.30 |
申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
KING, MARK R.;SCISM, WENDELL B. |
分类号 |
G01N21/88;G01N21/956;H01L21/66;(IPC1-7):G01N21/88 |
主分类号 |
G01N21/88 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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