Process for forming a positive pattern through deep ultraviolet exposure, heat treatment and development with TMAH solution containing an alcohol to improve adhesion

摘要

A pattern with good adhesiveness to a substrate and good shape and heat resistance can be formed by coating a pattern forming material comprising (a) a resin, (b) a photoacid generator and (c) a solvent on the substrate, exposing to deep UV light, and developing using a mixed solvent of tetramethylammonium hydroxide and an alcohol.