发明名称 LIQUID GASIFICATION APPARATUS
摘要 In a liquid gasification apparatus in which a liquid material (A) is held in a container (23) with the temperature thereof maintained at a constant level by a temperature regulating means (27a), a gas which does not react with this liquid being blown into the liquid to gasify the same liquid, a gas is generated stably by gasifying a predetermined quantity of liquid (A). A temperature regulating means (41) is provided at the portion of a container (23), in which a liquid (A) is held at a predetermined temperature, to which an inner hollow space (C) above the liquid (A) in the container (23) can extend, and the temperature in the inner hollow space (C) is controlled independently of that of the same liquid. The quantity of generated gas is stabilized to a predetermined level by maintaining the temperature in the inner hollow space (C) at a constant level higher than that of the temperature of the liquid (A).
申请公布号 WO9406529(A1) 申请公布日期 1994.03.31
申请号 WO1993JP01353 申请日期 1993.09.21
申请人 MITSUBISHI DENKI KABUSHIKI KAISHA;RYODEN SEMICONDUCTOR SYSTEM ENGINEERING CORPORATIO 发明人 SUENAGA, TAKAYUKI,;YAMAGUCHI, TOORU,;TSUTAHARA, KOUICHIROU,
分类号 H01L21/205;B01D1/00;B01D1/14;B01D1/26;B01D3/34;B01J7/02;C23C16/448;G06F1/26;G11C7/00;G11C11/407;G11C29/00;G11C29/06;H01L21/31;(IPC1-7):B01D1/14 主分类号 H01L21/205
代理机构 代理人
主权项
地址