Vacuum etch chamber and method for treating parts thereof.

摘要

Replaceable parts for a vacuum chamber including a lid (12), a door (16) and a shield (18), are treated to clean and roughen their surfaces to increase adhesion of materials deposited thereon during substrate processing in said chamber, thereby reducing downtime of the equipment. The parts (12,16,18) can be chemically cleaned, rinsed to remove the chemicals and dried in a first step. Then the parts are subjected to bead blasting to roughen the surface of the part and improve adhesion thereon of deposited material. In a succeeding step the parts are cleaned ultrasonically to remove all loose particles. And in an optional last step the parts are rinsed and dried to remove moisture. The parts can then be packaged or used. Furthermore, disclosed is a single-piece machined aluminum lid (12) which has an extension wall (14) from a first surface that fits into the door (16) of the chamber, and an overlying portion (13) of said first surface that optionally sealingly engages the door (16) when the lid (12) is closed.