发明名称 Recessed, self aligned, low base resistance structure.
摘要 <p>A semiconductor device is manufactured with precisely formed base and emitter regions. This is accomplished by arranging a plurality of insulator layer portions to form a plurality of windows. A dopant is then applied to the semiconductor device between the windows in order to accurately position emitter regions relative to base regions. In this manner a base of controlled dimensions can be formed. Thus the parasitic resistance of the base can be reduced and the figure of merit (emitter periphery/base area) can be increased. <IMAGE></p>
申请公布号 EP0589631(A1) 申请公布日期 1994.03.30
申请号 EP19930307352 申请日期 1993.09.17
申请人 SGS-THOMSON MICROELECTRONICS, INC. 发明人 IMHAUSER, WILLIAM P.
分类号 H01L21/331;H01L29/08;H01L29/10;(IPC1-7):H01L21/331 主分类号 H01L21/331
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