发明名称 DIFFUSION TIME CALCULATION AND SEMICONDUCTOR PRODUCING DEVICE THEREWITH
摘要 <p>PURPOSE:To make it possible to automatically calculate impurity diffusion time. CONSTITUTION:A mean value (step 101) of initial junction capacity at a plurality of bias voltages is compared with the data stored in a storage device showing the relationship between the junction capacity and the impurity diffusion time in order to find out the impurity diffusion time corresponding to an optional junction capacity before desired junction capacity (step 104). Then, the impurity diffusion is repeated several times up to the desired junction capacity and at every times the junction capacity is measured (step 107) to find out the impurity diffusion time thereof (step 109), and further the impurity diffusion is performed several times up to the desired capacity to obtain a target junction capacity.</p>
申请公布号 JPH0690012(A) 申请公布日期 1994.03.29
申请号 JP19920240351 申请日期 1992.09.09
申请人 HITACHI LTD 发明人 KAGAMI KIYOTAKA;ITO MITSUO;KANEKO TETSUO
分类号 H01L27/04;G06F19/00;H01L21/22;H01L21/329;H01L21/822;H01L29/93 主分类号 H01L27/04
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