| 摘要 |
The invention relates to a process for cleaning surfaces with a low-pressure plasma generated from a basic gas mixture at pressures of below 100 mbar. In order to obtain a highly effective cleaning plasma, it is proposed that the plasma be generated from a basic gas mixture consisting of 0.5 to 25 vol. % O2, 80 to 0.5 vol. % H2, 10 to 65 vol. % of a halogen hydrocarbon or SF6 and 0 to 40 vol. % Ar, N2 or He, this plasma simultaneously having an oxidising and reducing effect. |
