发明名称 Ablation mask and use thereof
摘要 An ablation mask that includes a transparent substrate having a patterned layer located between two dielectric transparent material coatings thereon is provided. Also, the ablation mask is useful in dry etching processes to provide patterned layers, and other laser processing applications that require high fluence such as photodeposition, thin film transfer and thin film release.
申请公布号 US5298351(A) 申请公布日期 1994.03.29
申请号 US19920996877 申请日期 1992.12.28
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 BOBROFF, NORMAN;ROSENBLUTH, ALAN E.
分类号 G03F1/08;G03F1/14;H01L21/027;H01L21/30;H01L21/302;(IPC1-7):G03F9/00 主分类号 G03F1/08
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