发明名称 |
Prodn of esp ferroelectric, thin layers - by vaporising material onto substrate using ion beam cluster, and heating layer produced in oxygen atmosphere |
摘要 |
Prodn. of thin layers comprises (a) vaporising one or more vaporising materials onto a substrate using an ion cluster beam process to produce a layer on the substrate; and (b) heating the layer produced to a reqd. temp. in an O2 atmosphere contg. atomic oxygen. USE/ADVANTAGE - Esp. for prodn. of ferroelectric thin layers. High quality thin layers are produced. The crystallisation with perovskite structure is accelerated.
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申请公布号 |
DE4331885(A1) |
申请公布日期 |
1994.03.24 |
申请号 |
DE19934331885 |
申请日期 |
1993.09.20 |
申请人 |
MITSUBISHI DENKI K.K., TOKIO/TOKYO, JP |
发明人 |
MORI, EISAKU, AMAGASAKI, HYOGO, JP |
分类号 |
C23C14/00;C23C14/08;C23C14/22;C23C14/32;(IPC1-7):C23C14/08;H01L21/203 |
主分类号 |
C23C14/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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