发明名称 |
Crosslinkable aqueous developable photoresist compositions and method for use thereof |
摘要 |
High sensitivity, high contrast, heat-stable resist compositions for use in deep UV, i-line e-beam and x-ray lithography. These compositions comprise a film-forming polymer having aromatic rings activated for electrophilic substitution, an acid catalyzable crosslinking agent which forms a hydroxy-stabilized carbonium ion, and a photoacid generator. The compositions are aqueous base developable.
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申请公布号 |
US5296332(A) |
申请公布日期 |
1994.03.22 |
申请号 |
US19910796155 |
申请日期 |
1991.11.22 |
申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
SACHDEV, HARBANS S.;CONLEY, WILLARD E.;JAGANNATHAN, PREMLATHA;KATNANI, AHMAD D.;KWONG, RANEE W.;LINEHAN, LEO L.;MUIRA, STEVE S.;SMITH, RANDOLPH J. |
分类号 |
G03F7/004;G03F7/038;G03F7/075;H01L21/027;H01L21/30;(IPC1-7):G03C5/56;G03C1/73;G03C1/76 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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