发明名称 |
Apparatus for forming thin film |
摘要 |
In the manufacture of a substrate with a hydrophobic film used for a reference electrode of an ion sensor or the like, a hydrophobic film is formed on a substrate by irradiating a target consisting of a hydrophobic compound with a neutral atom beam and thereby effecting sputtering. The apparatus for effecting the sputtering comprises a target base disposed in a vacuum chamber, an atom beam gun for irradiating a target on the target base with a neutral beam, a substrate base and a shutter for controlling the passage of sputtered particles. A thin film that is manufactured is suitable for an ion sensor, such as an ISFET or the like or an enzyme sensor.
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申请公布号 |
US5296122(A) |
申请公布日期 |
1994.03.22 |
申请号 |
US19920837873 |
申请日期 |
1992.02.18 |
申请人 |
TERUAKI KATSUBE;TERUMO KABUSHIKI KAISHA |
发明人 |
KATSUBE, TERUAKI;YAMAGUCHI, SHUICHIRO;UCHIDA, NAOTO;SHIMOMURA, TAKESHI |
分类号 |
C23C14/12;C23C14/46;G01N27/414;(IPC1-7):C23C14/46 |
主分类号 |
C23C14/12 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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