| 摘要 |
<p>PURPOSE:To provide a dry etching apparatus wherein the lack of a wafer contact part in a wafer holding mechanism can be detected. CONSTITUTION:In a dry etching apparatus which holds a wafer in such a way that its surface is faced downward, three wafer contact parts 5' are formed in a wafer holding jig 2' and slopes are formed at their tip parts. When the wafer contact parts are lacked, the wafer 1 is dropped and whether the wafer exists or not can be detected by a detection sensor. Consequently, it is possible to prevent that a defective product is caused due to dust particles producer by a lacked part.</p> |
