| 摘要 |
<p>PURPOSE:To improve display performance while assuring an advantage in cost by using a tantalum(Ta) thin film having the specific resistance of a specific value on the first metallic layer of a metal-insulating film-metal(MIM) type nonlinear element. CONSTITUTION:The Ta film 12 is deposited by sputtering on the front surface side of a transparent substrate 11 previously formed with a TaOx film 11a. As a result, the crystalline structure of the Ta film 12 is changed to a body centered cubic lattice and the specific resistance is lowered to <=30muOMEGA.cm. Such Ta film 12 is patterned. Then, the Ta film 12 is subjected to anodic oxidation to form this surface layer to TaOXfilm 13. An aq. soln. contg., for example, an aq. phosphoric acid soln. and ammonia is used as an electrolyte for anodic oxidation at this time. Pixel electrodes 4 are formed on the TaOx film 13. A Cr film 15 is formed by sputtering Cr and patterning the Cr. The liquid crystal display panel is formed by using the MIM type nonlinear element consisting of the Ta film 12, the TaOx film 13 and the Cr film 15.</p> |
