| 摘要 |
PURPOSE:To provide the process for production capable of producing the black matrix substrate which is usable for flat displays, such as liquid crystal displays, imagers, such as CCDs, or color filters of color sensors, etc., and has high dimensional accuracy and excellent light shieldability. CONSTITUTION:A photosensitive resist layer 3 contg. a hydrophilic resin is formed on a transparent substrate 13. This photosensitive resist layer 3 is exposed and developed via a photomask 9 having patterns for a black matrix to form relief 4 on the transparent substrate 13. After this transparent substrate 13 is subjected to a heat treatment, the relief 4 is brought into contact with an aq. soln. of a metal compd. serving as the catalyst for electroless plating and is then washed and dried to form the catalyst-contg. relief 5; thereafter, the catalyst-contg. relief 5 is brought into contact with an electroless plating liquid, by which the black relief 14 having patterns for the black matrix is formed. |
