| 摘要 |
PURPOSE:To provide a method for correcting pinhole defect in a phase shift mask by which the pinhole defect in the phase shift mask can easily be corrected without generating foreign matter or a pattern defect. CONSTITUTION:When a pinhole 4 appearing in a shifter film 3 is corrected, the pinhole 4 is filled with a defect correcting agent 5 (SOG film, PMMA film) having almost the same refractive index as that of the shifter film 3 without once removing the shifter film 3 including the pinhole and forming a new shifter film. Thereby, the pinhole defect can easily be corrected. |
