| 摘要 |
PURPOSE:To produce antireflection articles having excellent chemical durability at a high speed by forming at least one layer of the antireflection layers of multiple layers of transparent films consisting of a nitride or oxynitride contg zirconium and silicon. CONSTITUTION:A target is formed of a mixture composed of the zirconium and the silicon. Namely, the compsn. of the target to be used for forming the transparent films by a reactive sputtering method is ZrSix and the chemical formula of the transparent films is expressed by ZrSixOyNz. The transparent films respectively varying in refractive indices are laminated by executing reactive sputtering in a reduced pressure atmosphere at changed mixing ratios of argon, oxygen and nitrogen by using the ZrSix target, by that, the antireflection layers capable of lowering the reflectivity by an interference effect are formed. The ZrSix to constitute the sputtering target has the better electrical conductivity than the electrical conductivity of the silicon alone and is, therefore, applicable as the target for DC sputtering capable of forming the films uniform over the large area at a high speed. |
