| 摘要 |
PURPOSE: To improve sensitivity and resolution by using a specified oxime sulfonate as a radiation-sensitive photoacid producing agent in a specified photoresist which can be developed in an alkali medium and is chemically amplified. CONSTITUTION: An oxime sulfonate expressed by formula I is used as a radiation-sensitive photoacid producing agent in a photoresist which can be developed in an alkali medium, has sensitivity for radiation in 340 to 390nm wavelength region and is chemically amplified. In formula I, R is a naphthyl group or a group expressed by formula II, Ar is an unsubstd. aryl group, nitro group, chloro group, etc. In formula II, R0 is R1 -X group or R2 , X is an oxygen or sulfur atom, R1 is a hydrogen atom, 1 to 4C alkyl group, etc., R2 is a hydrogen atom, 1 to 4C alkyl group or substituent which can be decomposed with acid. |
