| 摘要 |
<p>PURPOSE:To form a matrix array substrate with a small number of defects by greatly decreasing defects in the patterning of electric conductors without altering an MIM element structure large. CONSTITUTION:The manufacture of the matrix array substrate is provided with the 1st process wherein a 1st electrode layer 2 is formed, the 2nd process wherein an insulating layer 3 is formed on the surface of the 1st electrode layer 2, the 3rd process wherein a 2nd electrode layer 4 is formed on the insulating layer 3 to width wider than specific line width, and the 4th process wherein a part of a transparent conductive film being a display pixel electrode 5 is formed on the 2nd electrode layer 4 to the same line width as the specific line width of the 2nd electrode layer 4 and the excessive part of the 2nd electrode layer 3 is exposed and then the excessive part of the 2nd electrode layer 4 exposed from the transparent conductive film is etched and removed by using the transparent conductive film as a mask.</p> |
