| 摘要 |
<p>PURPOSE:To obtain a pellicle film in a clean state and to unnecessitate a drying process after forming the film by peeling the pellicle film from a substrate in a gas. CONSTITUTION:A soln. prepared by dissolving the material to from a pellicle film in a solvent is applied on a substrate by soln. casting method to form a pellicle film, then a pellicle frame is adhered to the pellicle film. Then the pellicle film is peeled from the substrate. Since the pellicle film is adhered to the pellicle frame, the pellicle film can be peeled only by pulling the substrate in a gas in a chamber of the peeling process. In this process, peeling property is improved with higher humidity of the gas, and it is preferable to peel the film an atmosphere of >=60% relative humidity. If the humidity is too high and causes dew condensation, foreign matter is diffused due to drops same as peeling in water and the film is not uniformly dried. Therefore, it is necessary to avoid too high humidity.</p> |
