Lithographisches Verfahren zur Positionierung von Mikrostrukturen,申请号DE19914124025-传众专利搜索

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发明名称	Lithographisches Verfahren zur Positionierung von Mikrostrukturen
摘要
申请公布号	DE4124025(C2)	申请公布日期	1994.03.10
申请号	DE19914124025	申请日期	1991.07.19
申请人	HEIDELBERG INSTRUMENTS MIKROTECHNIK GMBH, 69120 HEIDELBERG, DE	发明人	FANGERAU, MICHAEL, 69181 LEIMEN, DE;WIJNAENDTS VAN RESANDT, ROELOF WILLEM, 76669 BAD SCHOENBORN, DE
分类号	G03F7/20;(IPC1-7):G03F7/20;H01L21/31	主分类号	G03F7/20
代理机构		代理人
主权项
地址

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