Verfahren und Vorrichtung zur Herstellung von Feinstrukturen.
摘要
<p>Herein is provided a fine pattern forming method which is prevented from the charging-up phenomenon at the time of electric charged beam writing owing to the use of a polyalkylthiophene type conductive polymeric substance or a quaternary ammonium ion type polymeric substance in a monolayer or multilayer resist.</p>
申请公布号
DE68912664(D1)
申请公布日期
1994.03.10
申请号
DE1989612664
申请日期
1989.06.29
申请人
MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD., KADOMA, OSAKA, JP