发明名称 Semiconductor device having an isolation layer region on the side wall of a groove
摘要 Steps or grooves are formed in a surface of a semiconductor substrate of a semiconductor device having a plurality of semiconductor elements, and an isolation layer is formed on regions that include the steps or side walls of the grooves.
申请公布号 US5293061(A) 申请公布日期 1994.03.08
申请号 US19920978461 申请日期 1992.11.19
申请人 SEIKO INSTRUMENTS INC. 发明人 HOSAKA, TAKASHI
分类号 H01L21/762;(IPC1-7):H01L29/06;H01L29/00 主分类号 H01L21/762
代理机构 代理人
主权项
地址