发明名称 Developer composition for irradiated, radiation-sensitive positive-working, negative-working and reversible reprographic layers
摘要 The present invention relates to a developer composition for radiation-sensitive positive-working and negative-working and reversible reprographic layers which apart from a radiation-sensitive compound or radiation-sensitive combination of compounds contain, as an essential constituent, a binder which is insoluble in water but soluble in aqueous-alkaline solutions, said developer composition being characterized in that it contains, as essential constituents, (a) O- carboxymethyl- or O,O'-biscarboxymethylethylene glycol or an appropriately substituted polyethylene glycol comprising 2 to about 500 ethylene glycol units, (b) at least one compound showing an alkaline reaction in water, selected from the group including alkali metal hydroxides, alkali metal silicates, alkali metal phosphates, alkali metal borates, ammonium hydroxides, ammonium silicates, ammonium phosphates and ammonium borates, and (c) water. The developer composition gives a very good yield, makes possible short developing times and does not cause any problems due to flaky deposits of layer constituents or foaming. A process for developing positive-working, negative-working and reversible reprographic layers with the developer composition is also disclosed.
申请公布号 US5292626(A) 申请公布日期 1994.03.08
申请号 US19910750313 申请日期 1991.08.27
申请人 HOECHST AKTIENGESELLSCHAFT 发明人 BUHR, GERHARD;ELSAESSER, ANDREAS;FRASS, HANS W.;LEUPOLD, ERNST I.
分类号 G03F7/32;(IPC1-7):G03F7/32 主分类号 G03F7/32
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