Method of obtaining hologram and an exposure apparatus

摘要

A hologram exposure apparatus for and method of obtaining a hologram using a photoresist for an in-line type interferometer wherein a photoresist substrate is detachably mounted on a substrate rotating device. A concentric pattern of a hologram from a source of light is projected onto the photoresist on the substrate mounted on the substrate rotating device while rotating the substrate and moving a projecting device in a direction at right angles with the rotary shaft of the photoresist substrate.