发明名称 |
Low ozone depleting organic chlorides for use during silicon oxidation and furnace tube cleaning |
摘要 |
A process for thermal oxidation of silicon or cleaning of furnace tubes used in semiconductor manufacturing by exposing the silicon or tube to temperatures above 700 degrees C. while flowing a carrier gas containing oxygen and a chlorohydrocarbon having a general formula CxHxClx where x is 2, 3, or 4 over the silicon or tube. The chlorohydrocarbon is selected to readily and completely oxidize at temperature.
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申请公布号 |
US5288662(A) |
申请公布日期 |
1994.02.22 |
申请号 |
US19920898857 |
申请日期 |
1992.06.15 |
申请人 |
AIR PRODUCTS AND CHEMICALS, INC. |
发明人 |
LAGENDIJK, ANDRE;HOCHBERG, ARTHUR K.;ROBERTS, DAVID A. |
分类号 |
C01B7/01;C23C16/44;C23G5/028;H01L21/31;H01L21/316;(IPC1-7):H01L21/31 |
主分类号 |
C01B7/01 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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