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发明名称
ETCHING PROCESS OF WAFER
摘要
申请公布号
JPH0645314(A)
申请公布日期
1994.02.18
申请号
JP19920066408
申请日期
1992.03.24
申请人
MITSUBISHI MATERIALS CORP;MITSUBISHI MATERIALS SHILICON CORP
发明人
INOUE FUMIO;OBA SHIGEO;TAKAISHI KAZUNARI;OKADA TADASHI;SHIMIZU SATOSHI
分类号
H01L21/306;H01L21/308;(IPC1-7):H01L21/306
主分类号
H01L21/306
代理机构
代理人
主权项
地址
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