METHOD OF MAKING HIGH TEMPERATURE OXIDE FILM IN HORIZONTAL TYPE CVD APPARATUS

摘要

The fabrication method comprises the conditions that; the pressure for deposition ranges 2.25-2.75 (Torr); the temperature for deposition ranges 720-780 deg.C; the temperature gradient for deposition varies ±10 - ±20 deg.C from centre to door or to back side; process gases are SiN4 and N2O; a high temperature oxide layer is formed by back-to-bac loading with gage boats having a boat slot spacing of 1/2 in and 9/16 in.