发明名称 POSITIVE-ACTING RADIATION-SENSITIVE MIXTURE AND RECORDING MATERIAL PRODUCED THEREWITH
摘要 The invention relates to a positive-acting radiation-sensitive mixture with: a) a compound which forms an acid under the effect of actinic radiation, b) a compound with at least one C-O-C- or C-O-Si bond which can be split by this acid and c) a polymeric binder which is insoluble in water but soluble or at least swellable by aqueous alkaline solutions, in which the compound (a) corresponds to the general formula: R1(-SO2-R2)n, in which R1 is an n-valent (C1C3)alkane radical, R2 are the same or different and are aryl, aralkyl, heteroaryl or heteroaralkyl radicals and n is a whole number from 2 to 4. The radiation-sensitive mixture of the invention has high resolution and great sensitivity over a wide spectral range. It also exhibits great thermal stability and does not form any corrosive photolysis products on exposure. The invention also relates to a radiation-sensitive recording material made therefrom which is suitable for making photoresists, electronic components and printing plates or for moulding etching.
申请公布号 WO9403837(A1) 申请公布日期 1994.02.17
申请号 WO1993EP01431 申请日期 1993.06.07
申请人 HOECHST AKTIENGESELLSCHAFT 发明人 WENGENROTH, HORST;SPIESS, WALTER;BUHR, GERHARD;ROESCHERT, HORST;PAWLOWSKI, GEORG;FUCHS, JUERGEN
分类号 C08K5/42;C09D125/18;G03F7/004;G03F7/039;H01L21/027;(IPC1-7):G03F7/004;C07C315/04 主分类号 C08K5/42
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