发明名称 |
POSITIVE-ACTING RADIATION-SENSITIVE MIXTURE AND RECORDING MATERIAL PRODUCED THEREWITH |
摘要 |
The invention relates to a positive-acting radiation-sensitive mixture with: a) a compound which forms an acid under the effect of actinic radiation, b) a compound with at least one C-O-C- or C-O-Si bond which can be split by this acid and c) a polymeric binder which is insoluble in water but soluble or at least swellable by aqueous alkaline solutions, in which the compound (a) corresponds to the general formula: R1(-SO2-R2)n, in which R1 is an n-valent (C1C3)alkane radical, R2 are the same or different and are aryl, aralkyl, heteroaryl or heteroaralkyl radicals and n is a whole number from 2 to 4. The radiation-sensitive mixture of the invention has high resolution and great sensitivity over a wide spectral range. It also exhibits great thermal stability and does not form any corrosive photolysis products on exposure. The invention also relates to a radiation-sensitive recording material made therefrom which is suitable for making photoresists, electronic components and printing plates or for moulding etching. |
申请公布号 |
WO9403837(A1) |
申请公布日期 |
1994.02.17 |
申请号 |
WO1993EP01431 |
申请日期 |
1993.06.07 |
申请人 |
HOECHST AKTIENGESELLSCHAFT |
发明人 |
WENGENROTH, HORST;SPIESS, WALTER;BUHR, GERHARD;ROESCHERT, HORST;PAWLOWSKI, GEORG;FUCHS, JUERGEN |
分类号 |
C08K5/42;C09D125/18;G03F7/004;G03F7/039;H01L21/027;(IPC1-7):G03F7/004;C07C315/04 |
主分类号 |
C08K5/42 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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